17³Ô¹Ï

Kostas Adam leads 17³Ô¹Ï R&D and Product Engineering for the Mask 17³Ô¹Ï group. Prior to that, he was with Siemens EDA (known as Mentor Graphics until the 2017 acquisition by Siemens) for more than 20 years. He has worked in the Calibre OPC product line, in roles ranging in the early years from individual contributor to most recently the VP of engineering for all Mask Synthesis products of Calibre. Kostas has a PhD degree in EECS from UC Berkeley.

Kevin Lucas received a Ph.D. in E.E. from Carnegie Mellon Univ. with a thesis on rigorous lithography simulation. ?He then joined Motorola Semiconductor where he worked on OPC, lithography simulation and design rules with partners including IMEC, AMD, TSMC, ST, Phillips and IBM. He joined 17³Ô¹Ï in 2006 where he is a Senior Architect working on cross-functional High-NA EUV and Mask Error Correction flows.? He is a Fellow of SPIE and has ~200 publications in the field of optical lithography.

Thuc Dam holds a PhD in applied organic chemistry from UTD.  He has worked in semiconductor field for 24 years with 30+ publications and 2 patents, and has previously been employed in technical and managerial roles at Intel and Luminescent Inc.  His innovations in mask process development, ILT, SMO, and DRE have contributed extensively to the computational lithography domain.  He is growing his experience in DTCO, AR/VR and EUV.  He is currently the Director of Applications Engineering for the ILT, PLRC & SMO groups at 17³Ô¹Ï.

Dr. Victor Moroz is a 17³Ô¹Ï Fellow, engaged in a variety of projects on modeling Design-Technology Co-Optimization, FinFETs, gate-all-around transistors, stress engineering, 3D ICs, transistor scaling, cryogenic devices, Middle-Of-Line and Back-End-Of-Line resistance and capacitance, solar cell design, innovative patterning, random and systematic variability, junction leakage, non-Si transistors, and atomistic effects in layer growth and doping. Several facets of this activity are reflected in three book chapters, a 100+ technical papers and over 300 US and international patents. Victor has been involved in technical committees at ITRS, IEDM, SISPAD, DFM&Y, ECS, IRPS, EDTM, and ESSDERC, including serving as a Technical Chair of SISPAD 2018 and a max term Editor of IEEE Electron Device Letters.

Dr. Uli Klostermann, received his PhD in Physics for his work on the patterning and characterization of nanometer sized magnetic tunnel junctions (MRAM). Before joining 17³Ô¹Ï, he worked in various positions in the technology development for next generation MRAM devices in the MRAM Development Alliance IBM/Infineon in US and later France and Germany. After joining 17³Ô¹Ï 2008, he focused on ensuring technology leadership for S-Litho in collaboration with our RnD team. He has initiated or contributed to numerous innovations, patents and publications in the fields of MRAM technology and lithographic simulations.

WooJoo is a Senior Manager of R&D at 17³Ô¹Ï, specializing in AI solutions for lithography and Optical Proximity Correction (OPC). His journey began with a Ph.D. at POSTECH, studying string theory. He then worked at Samsung Electronics on OPC, inspired by AlphaGo to delve into artificial intelligence. As a visiting scholar at the University of Michigan, he studied deep learning OPC and design optimization. He led the development of Samsung's in-house OPC software, applying deep learning techniques to enhance performance. WooJoo also worked at Standigm, an AI drug discovery company, before returning to the OPC field at 17³Ô¹Ï, aiming to expand its applications.