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Join us for an in-person 17³Ô¹Ï Technical Forum, taking place during 2025 SPIE Advanced Lithography + Patterning. Attendees will learn about the latest industry trends along with 17³Ô¹Ï Manufacturing's mask synthesis, mask data prep, and lithography simulation solutions.
Why Attend?
17³Ô¹Ï provides industry-proven EDA solutions to meet the demands of today¡¯s advanced IC manufacturing processes while setting the standard in platform flexibility to enable innovative and custom solutions for next-generation technology nodes. 17³Ô¹Ï¡¯ comprehensive Mask Synthesis, Mask Data Preparation, TCAD, and Yield Management tools provide leading edge performance, accuracy, quality, and cost of ownership for all your production and development needs.
Who Should Attend?
The 17³Ô¹Ï Technical Forum provides OPC, RET, and MDP engineers and managers practical insight into upcoming industry trends and solutions for delivering the highest quality results from their lithography hardware.
Agenda
12:00 - 12:20 PM
Registration & Lunch
12:20 - 12:30 PM
Welcome & Introduction
Kostas Adam, 17³Ô¹Ï
12:30 - 1:00 PM
High NA EUV Pathfinding for Continued GAA Scaling and Next Generation Architecture Enablement
Dan Dechene, IBM
1:00 - 1:30 PM
High NA EUV: Stitching for Manufacturing
Kimberly Pierce, Intel
1:30 - 2:00 PM
Application of RealCurve OPC for Advanced Memory
Eric Christensen, Micron
2:00 - 2:30 PM
Enhancing OPC Accuracy in 28nm-class Analog Devices: Addressing Degradation in Specific BEOL Patterns Through Recipe Tuning and Simulation
Keeho Kim, Texas Instruments
2:30 - 3:00 PM
FUJIFILM Electronic Materials Activities for Next Generation Lithography
Naohiro Tango, Fujifilm
3:00 - 3:20 PM
Novel Generative-AI Applications to Physical Design Layout Analytics, Mask Data Synthesis and Lithography Process Simulation
Luigi Capodieci, 17³Ô¹Ï
3:20 - 4:00 PM
Thank you & networking reception
17³Ô¹Ï at 2025 SPIE Advanced Lithography + Patterning
Presenter: Kostas Adam - Vice President of R&D Engineering, 17³Ô¹Ï
Date & Time: February 25 | 11:10 ¨C 11:50 AM
See the full list of 17³Ô¹Ï presented papers & technical sessions happening at SPIE.
17³Ô¹Ï Booth #208
Visit our booth on the exhibit floor to view the latest innovative technologies and chat with 17³Ô¹Ï experts live on February 25-26!
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