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TCAD 17³Ô¹Ï
Technology Computer-Aided Design (TCAD) refers to the use of computer simulations to develop and optimize semiconductor process technologies and devices. 17³Ô¹Ï TCAD offers a comprehensive suite of products that includes industry-leading process and device simulation tools, as well as a powerful graphical user interface (GUI) driven simulation environment for managing simulation tasks and analyzing simulation results. In addition, 17³Ô¹Ï TCAD provides tools for interconnect modeling and extraction, providing critical parasitic information for optimizing chip performance.
? 17³Ô¹Ï TCAD is the industry leader in 3D technology modeling
? Provides integrated simulation environment for Design Technology Co-Optimization
? Delivers production-proven modeling solutions for Logic, Memory, Power, and CIS applications
? Offers smart technology modeling enables cost and time savings in pathfinding, development, and production ramping of semiconductor technologies
Latest Product Release
We are very pleased to announce TCAD Sentaurus W-2024.09-SP1. The latest version of TCAD Sentaurus includes many new exciting features and performance enhancements. If you are a customer entitled to maintenance services, then you can access TCAD Sentaurus W-2024.09-SP1 and download release notes directly from SolvNetPlus.
Products
Sentaurus Calibration Workbench
Sentaurus? Calibration Workbench is built for automated workflow-oriented calibration of TCAD models, based on innovative machine learning (ML) capabilities. It is designed to leverage TCAD technology to the next level by enabling users to calibrate process and device simulation models rapidly and systematically for maximum accuracy and predictivity, and thus, reduce the need for expensive experimental wafers in the technology/device development and optimization phases.
Atomic-Scale Modeling
QuantumATK simulates the properties and transport mechanisms of novel materials and device structures, enabling the down-selection of promising materials for further exploration and the TCAD-level simulation of advanced devices before wafer-based data is available. Sentaurus Materials Workbench provides a link between QuantumATK output and TCAD models implemented in Sentaurus simulators.
Process Simulation
Sentaurus Process is the industry standard for simulating the fabrication steps of semiconductor processes, ranging from silicon-based logic, memory, power, and CIS technologies to SiC-based technologies. Sentaurus Process supports the modeling of implantation, diffusion and dopant activation, thermal oxidation, mechanical stress, and epitaxial growth. Sentaurus Topography supports the modeling of topographical steps including etching, deposition, CMP, and electroplating.
Process Emulation
Sentaurus Process Explorer is a fast 3D process emulator used to identify and correct process integration issues during technology development. Sentaurus Process Explorer produces highly realistic 3D representations of process structures using GDSII mask data and a process recipe as input. Sentaurus Process Explorer is linked to the 17³Ô¹Ï TCAD simulators, such as Raphael FX, to enable the high accuracy RC extraction in Design Technology Co-Optimization (DTCO) applications.
Structure Editing
Sentaurus Structure Editor is a device structure editor used to create structures for device simulation when process simulation is not required. Sentaurus Structure Editor uses geometric primitives powered by the ACIS? geometry kernel to render complex device shapes. A graphical user interface serves as the front end for mesh generation engines available in Sentaurus Process and Sentaurus Device. The Sentaurus Structure Editor command language recreates the device structure in batch mode as part of a simulation flow.
Device Simulation
Sentaurus Device is the industry standard for simulating the electrical characteristics of silicon-based and compound semiconductor devices as a response to external electrical, thermal or optical boundary conditions. Advanced physical models for quantum effects, ballistic transport, tunneling processes, stress engineering, hot carrier effects, and other transport phenomena support the optimization of state-of-the-art devices ranging from advanced logic and memory to analog, power and optoelectronics devices.
Interconnect Simulation
Interconnect simulation tools address the electrical and reliability performance of middle-of-line and back-end-of-line interconnect structures. Raphael FX is the industry gold-standard 3D field solver for extracting the resistance and capacitance of detailed interconnect structures, SRAM cells, and standard cells in DTCO. Sentaurus Interconnect simulates the reliability of interconnect structures based on the mechanical stress generated through thermal processing and externally applied forces.
TCAD Environment
Sentaurus Workbench is a complete graphical environment for creating, managing, executing, and analyzing TCAD simulations. Its intuitive graphical user interface (GUI) allows users to efficiently navigate and automate the typical tasks associated with running TCAD simulations such as managing the information flow, including preprocessing of user input files, parameterizing projects, setting up and executing tool instances, optimization, and visualizing results. Sentaurus Visual is an advanced visualization tool for TCAD data. It includes extensive capabilities for plotting and interactively manipulating xy data as well as 2D and 3D TCAD structures.
TCAD-to-SPICE
Mystic extracts compact model parameters (standard SPICE models, macro models, Verilog-A models) from Sentaurus TCAD output, enabling technology development and DTCO teams to simulate the impact of new transistor designs using circuit-level metrics before wafers are available. The TCAD-to-SPICE flow also supports the simulation of the impact of process variability at the circuit-level through the extraction of variation-aware compact models using the variability engine Garand VE and the model card generator RandomSpice.
Calibration and Services
17³Ô¹Ï TCAD tools are used by process and device engineers at all major semiconductor companies to develop and optimize semiconductor technologies. Occasionally, the tools need to be calibrated for a particular technology, so that they can be more predictive for future nodes. 17³Ô¹Ï TCAD Services offers calibration, simulation, model development, and consulting to customers. Our team targets the optimization of processes and devices using TCAD tools and the investigation of technology development and manufacturing issues using a vast knowledge base of proven process and device modeling methods.
Extraction Continuum
The Extraction Continuum provides an automated flow to transition from one field solver to another, making the DTCO chain more efficient. It also brings design PPA closer to process capabilities due to tighter correlation between the tools. The Extraction Continuum is comprised of three 17³Ô¹Ï tools: Raphael FX, QuickCap NX and StarRC.