17³Ô¹Ï Cloud
Cloud native EDA tools & pre-optimized hardware platforms
Request a Free Trial
The 17³Ô¹Ï Technical Forum provides OPC, RET, and MDP engineers and managers practical insight into upcoming industry trends and solutions for delivering the highest quality results from their lithography hardware.
?
If you missed attending the event live, register below to watch the presentations on-demand.
?
Keynote: The Brave New World of Multi-Node Mask Making
Chris Progler, Chief Technology Officer, Photronics Inc
EUV Lithography Patterning: ?Status and Challenges Towards
High NA
Danilo DeSimone, Principal Member of Technical Staff, IMEC
Curvilinear Mask 17³Ô¹Ï for ?EUV Lithography Enablement
Thuc Dam?, Sr. Product Engineering Mgr., 17³Ô¹Ï
?
Please visit our sessions and posters page to learn more about 17³Ô¹Ï at SPIE Advanced Lithography + Patterning 2023