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Description
Photonic device production is increasing with AR/VR devices. AR/VR optical components include metalenses patterned over large areas, and the fidelity of this pattern may have a significant impact on performance. In this presentation, we will demonstrate the impact of various lithographic and correction techniques on metalens performance.
Presenters
Dr. Maryvonne Chalony
Senior Applications Engineer
17³Ô¹Ï
Dr. Maryvonne Chalony received a Ph.D. degree in Physical Sciences from the University of Nice-Sophia Antipolis in 2010. She is now an applications engineer in Hyeres, France for 17³Ô¹Ï Optical 17³Ô¹Ï. She has 10 years of optical and photonic software experience with a focus on photonics and nano-structure design and simulation.
Bernd K¨¹chler
Applications Engineer
17³Ô¹Ï
Bernd K¨¹chler is a Lithography Simulation Applications Engineer at 17³Ô¹Ï. He holds an M.Sc. degree in Information Technology from Chalmers University, Gothenburg, Sweden.
Prior to 17³Ô¹Ï, Bernd worked at Infineon on future lithography development.
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