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Cockpit Tool for Layout Visualization, S-Litho, S-Metro, and TCAD Applications
17³Ô¹Ï Silicon WorkBench (SiWB) is a powerful, hierarchical layout visualization and analysis tool. It allows viewing and editing GDSII and OASIS? layouts from small IP blocks to full chip databases.
Gigabytes of data can be loaded within minutes. Fast zooming and panning ease exploration and analysis of the largest layout patterns. Layout centric S-Litho, S-Metro, and TCAD applications are supported through a dedicated user interface to simplify the handling of layout clips.
Key Benefits
Versatile Layout Editing and Viewing
17³Ô¹Ï Silicon WorkBench provides high speed, high-capacity layout viewing and editing capabilities for GDS2, OASIS, and LEF/DEF files with low memory overhead. It covers various modes for merging layout of mixed format, compares layouts, cells, and generates difference reports.
Besides flexible user and site-level customization options, 17³Ô¹Ï Silicon WorkBench provides application specific environments and users interfaces supporting the following 17³Ô¹Ï products:
S-Litho
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Silicon WorkBench Interface to S-Litho
17³Ô¹Ï Silicon WorkBench can be used as a cockpit for running rigorous lithography simulations in the background and visualizing results within the layout context.? It enables distributed processing for multiple layout clips and provides the infrastructure for resist model calibration and well a training environment for machine learning models.?
S-Metro
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Silicon WorkBench Interface to S-Metro
17³Ô¹Ï Silicon WorkBench supports layout operations in combination with 17³Ô¹Ï S-Metro, a comprehensive solution for CD SEM metrology data visualization and analysis.? SEM images can be overlayed with the corresponding layout clip to identify measurement locations, to extract image contours, and display analysis results.?
Silicon WorkBench Interface to TCAD Appilcations
Within the 17³Ô¹Ï Silicon WorkBench GUI users can conveniently add special mark-ups to a standard layout file to easily drive layout-driven processing simulations with TCAD tools, such as Sentaurus Process, Process Explorer, and Sentaurus Interconnect. Specifically, users can define 1D, 2D, and 3D TCAD simulation domains, as well as markers for TCAD-specific layout parametrizations.??
Resources
White Paper
Reduce Augmented Reality Device Time-to-Market by Bringing Manufacturing Impact to Optical Simulation
Blog
Curvilinear Mask Patterning for Maximizing Lithography Capability